Interface structure and strain relaxation in BaTiO3 thin films grown on GdScO3 and DyScO3 substrates with buried coherent SrRuO3 layer

Authors
Chen, Y. B.Sun, H. P.Katz, M. B.Pan, X. Q.Choi, K. J.Jang, H. W.Eom, C. B.
Issue Date
2007-12-17
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.91, no.25
Abstract
To obtain the electrical properties of strained ferroelectric thin films, bottom electrodes with lattice constants and thermal coefficients matched to both films and substrates are needed. The interface structure, strain configuration, and strain relaxation in such bilayer systems are different from those in single layer systems. Here, we report transmission electron microscopy studies of epitaxial BaTiO3 films grown on GdScO3 and DyScO3 substrates with buried SrRuO3 layers. We found that the different strain relaxation behaviors observed in the bilayer are mainly dependent on lattice mismatch of each layer to the substrate and the thicknesses of each layer.
Keywords
DISLOCATION; FERROELECTRICITY; ENHANCEMENT; EVOLUTION; SRTIO3; DISLOCATION; FERROELECTRICITY; ENHANCEMENT; EVOLUTION; SRTIO3
ISSN
0003-6951
URI
https://pubs.kist.re.kr/handle/201004/133878
DOI
10.1063/1.2819684
Appears in Collections:
KIST Article > 2007
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