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dc.contributor.authorSong, Ki-Bong-
dc.contributor.authorLee, Sang-Su-
dc.contributor.authorKim, Kyung-Am-
dc.contributor.authorSuh, Jeong-Dae-
dc.contributor.authorKim, Jun-Ho-
dc.contributor.authorLee, Taek-Sung-
dc.contributor.authorCheong, Byung-Ki-
dc.contributor.authorKim, Won-Mock-
dc.date.accessioned2024-01-21T01:00:50Z-
dc.date.available2024-01-21T01:00:50Z-
dc.date.created2021-09-02-
dc.date.issued2007-06-25-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/134314-
dc.description.abstractA technique to develop an undoped homojunction chalcogen thin-film transistor (UHJ-c-TFT) on glass is described. The UHJ-c-TFT is based on ternary chalcogenide alloy amorphous (alpha) Ge2Sb2Te5 (GST) and the positively cooled crystalline (chi) GST. The alpha-GST and the positively cooled chi-GST are used as a channel layer and ohmic contact layer, respectively. In the UHJ-c-TFT, the authors realize electric rectification by the energy difference from the Fermi level of the alpha-GST and the Fermi level of the positively cooled chi-GST. The UHJ-c-TFT shows the clear gate characteristics of a typical p-channel enhancement mode. (c) 2007 American Institute of Physics.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.titleUndoped homojunction chalcogen thin-film transistors on glass-
dc.typeArticle-
dc.identifier.doi10.1063/1.2753102-
dc.description.journalClass1-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.90, no.26-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume90-
dc.citation.number26-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000247625500090-
dc.identifier.scopusid2-s2.0-34547272846-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordAuthorchalcognide-
dc.subject.keywordAuthorthin-film transistor-
dc.subject.keywordAuthorGe2Sb2Te5-
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