Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Han-Ki | - |
dc.contributor.author | Kim, Sang-Woo | - |
dc.contributor.author | Kim, Do-Geun | - |
dc.contributor.author | Kang, Jae-Wook | - |
dc.contributor.author | Kim, Myung Soo | - |
dc.contributor.author | Cho, Woon Jo | - |
dc.date.accessioned | 2024-01-21T01:04:31Z | - |
dc.date.available | 2024-01-21T01:04:31Z | - |
dc.date.created | 2021-09-02 | - |
dc.date.issued | 2007-04-09 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/134460 | - |
dc.description.abstract | The characteristics of an SiNx passivation layer grown by a specially designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system with straight antennas for the top-emitting organic light emitting diodes (TOLEDs) are investigated. Using a high-density plasma on the order of similar to 10(11) electronS/cm(3) formed by nine straight antennas connected in parallel, a high-density SiN, passivation layer was deposited on a transparent Mg-Ag cathode at a substrate temperature of 40 degrees C. Even at a low substrate temperature, single SiN, passivation layer prepared by ICP-CVD showed a low water vapor transmission rate of 5 x 10(-2) g/m(2)/day and a transparency of similar to 85% respectively. In addition, current-voltage-luminescence results of the TOLED passivated by the SiNx layer indicated that the electrical and optical properties of the TOLED were not affected by the high-density plasma during the SiN, deposition process. (c) 2006 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | SURFACE PASSIVATION | - |
dc.subject | DEVICES | - |
dc.subject | DEGRADATION | - |
dc.subject | CATHODE | - |
dc.subject | LAYERS | - |
dc.title | Thin film passivation of organic light emitting diodes by inductively coupled plasma chemical vapor deposition | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.tsf.2006.11.030 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | THIN SOLID FILMS, v.515, no.11, pp.4758 - 4762 | - |
dc.citation.title | THIN SOLID FILMS | - |
dc.citation.volume | 515 | - |
dc.citation.number | 11 | - |
dc.citation.startPage | 4758 | - |
dc.citation.endPage | 4762 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000245259600034 | - |
dc.identifier.scopusid | 2-s2.0-33847226312 | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | SURFACE PASSIVATION | - |
dc.subject.keywordPlus | DEVICES | - |
dc.subject.keywordPlus | DEGRADATION | - |
dc.subject.keywordPlus | CATHODE | - |
dc.subject.keywordPlus | LAYERS | - |
dc.subject.keywordAuthor | ICP-CVD | - |
dc.subject.keywordAuthor | straight antenna | - |
dc.subject.keywordAuthor | TOLED | - |
dc.subject.keywordAuthor | SiNx | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.