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dc.contributor.authorKim, Han-Ki-
dc.contributor.authorKim, Sang-Woo-
dc.contributor.authorKim, Do-Geun-
dc.contributor.authorKang, Jae-Wook-
dc.contributor.authorKim, Myung Soo-
dc.contributor.authorCho, Woon Jo-
dc.date.accessioned2024-01-21T01:04:31Z-
dc.date.available2024-01-21T01:04:31Z-
dc.date.created2021-09-02-
dc.date.issued2007-04-09-
dc.identifier.issn0040-6090-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/134460-
dc.description.abstractThe characteristics of an SiNx passivation layer grown by a specially designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system with straight antennas for the top-emitting organic light emitting diodes (TOLEDs) are investigated. Using a high-density plasma on the order of similar to 10(11) electronS/cm(3) formed by nine straight antennas connected in parallel, a high-density SiN, passivation layer was deposited on a transparent Mg-Ag cathode at a substrate temperature of 40 degrees C. Even at a low substrate temperature, single SiN, passivation layer prepared by ICP-CVD showed a low water vapor transmission rate of 5 x 10(-2) g/m(2)/day and a transparency of similar to 85% respectively. In addition, current-voltage-luminescence results of the TOLED passivated by the SiNx layer indicated that the electrical and optical properties of the TOLED were not affected by the high-density plasma during the SiN, deposition process. (c) 2006 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectSURFACE PASSIVATION-
dc.subjectDEVICES-
dc.subjectDEGRADATION-
dc.subjectCATHODE-
dc.subjectLAYERS-
dc.titleThin film passivation of organic light emitting diodes by inductively coupled plasma chemical vapor deposition-
dc.typeArticle-
dc.identifier.doi10.1016/j.tsf.2006.11.030-
dc.description.journalClass1-
dc.identifier.bibliographicCitationTHIN SOLID FILMS, v.515, no.11, pp.4758 - 4762-
dc.citation.titleTHIN SOLID FILMS-
dc.citation.volume515-
dc.citation.number11-
dc.citation.startPage4758-
dc.citation.endPage4762-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000245259600034-
dc.identifier.scopusid2-s2.0-33847226312-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusSURFACE PASSIVATION-
dc.subject.keywordPlusDEVICES-
dc.subject.keywordPlusDEGRADATION-
dc.subject.keywordPlusCATHODE-
dc.subject.keywordPlusLAYERS-
dc.subject.keywordAuthorICP-CVD-
dc.subject.keywordAuthorstraight antenna-
dc.subject.keywordAuthorTOLED-
dc.subject.keywordAuthorSiNx-
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KIST Article > 2007
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