Thermal stability of trilayer synthetic antiferromagnets

Authors
Han, J. K.Shin, K. H.Lim, S. H.
Issue Date
2007-03
Publisher
ELSEVIER
Citation
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, v.310, no.2, pp.2339 - 2341
Abstract
The thermal stability of coupled trilayer synthetic antiferromagnets is investigated in the framework of the new model, taking into account of the magnetostatic fields. At magnetic and other parameters typical for magnetic random access memory applications, the thermal stability of magnetic cells becomes problematic as the lateral dimensions approach 150 nm. At these dimensions, the energy barrier at zero applied field is calculated to be 40 kT ( at room temperature) and it decreases with increasing applied field. The effects related with the shape anisotropy, which are expected to be strong in this size range, are not properly described by the existing model. The present results show that this problem can be solved by accurately quantifying the magnetostatic. fields. (c) 2006 Elsevier B. V. All rights reserved.
Keywords
thermal stability; energy barrier; synthetic antiferromagnets; magnetic random access memory; high density
ISSN
0304-8853
URI
https://pubs.kist.re.kr/handle/201004/134597
DOI
10.1016/j.jmmm.2006.11.184
Appears in Collections:
KIST Article > 2007
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE