Enhancement in electrical and optical properties of indium tin oxide thin films grown using a pulsed laser deposition at room temperature by two-step process

Authors
Kim, Jong HoonDu Ahn, ByungLee, Choong HeeJeon, Kyung AhKang, Hong SeongKim, Gun HeeLee, Sang Yeol
Issue Date
2007-02-26
Publisher
ELSEVIER SCIENCE SA
Citation
THIN SOLID FILMS, v.515, no.7-8, pp.3580 - 3583
Abstract
The optical and electrical properties of indium tin oxide (ITO) thin films deposited using a pulsed laser deposition at room temperature can be substantially enhanced by adopting a two-step process. X-ray diffraction patterns and atomic force microscopy images were used to observe the structural properties of the films. High quality ITO films grown by two-step process could be obtained with the resistivity of 3.02 x 10(-4) mu cm, the carrier mobility of 32.07 cm(2)/Vs, and the transparency above 90% in visible region mainly due to the enhancement of the film crystallinity and the increase of grain size. (c) 2006 Elsevier B.V. All rights reserved.
Keywords
STRUCTURAL-PROPERTIES; CRYSTALLIZATION; ABLATION; STRESS; STRUCTURAL-PROPERTIES; CRYSTALLIZATION; ABLATION; STRESS; indium tin oxide; two-step process; electrical and optical properties
ISSN
0040-6090
URI
https://pubs.kist.re.kr/handle/201004/134636
DOI
10.1016/j.tsf.2006.11.006
Appears in Collections:
KIST Article > 2007
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