Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Tae Whan | - |
dc.contributor.author | Shin, Jae Won | - |
dc.contributor.author | Lee, Jeong Yong | - |
dc.contributor.author | Jung, Jae Hun | - |
dc.contributor.author | Lee, Jung Wook | - |
dc.contributor.author | Choi, Won Kook | - |
dc.contributor.author | Jin, Sungho | - |
dc.date.accessioned | 2024-01-21T01:34:21Z | - |
dc.date.available | 2024-01-21T01:34:21Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 2007-01-29 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/134722 | - |
dc.description.abstract | Electron-beam-induced Zn nanocrystal islands were formed in a dielectric SiO2 layer. When a ZnO thin film on a p-type Si with amorphous SiOx interface layer is subjected to a 900 degrees C annealing followed by electron irradiation in a transmission electron microscope environment, an amorphous Zn2xSi1-xO2 layer is formed. Upon irradiation with a 300 keV electrons, metallic and single crystal nanoislands of Zn with similar to 7-10 nm diameter were formed and embedded within the SiO2 interface layer. Possible mechanisms for the formation of Zn nanocrystals are presented. | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | QUANTUM-DOT | - |
dc.subject | SILICON NANOCRYSTALS | - |
dc.subject | ROOM-TEMPERATURE | - |
dc.subject | COULOMB-BLOCKADE | - |
dc.subject | FABRICATION | - |
dc.subject | TRANSISTORS | - |
dc.subject | MICROSCOPE | - |
dc.subject | SYSTEM | - |
dc.subject | MEMORY | - |
dc.subject | FIELD | - |
dc.title | Electron-beam-induced formation of Zn nanocrystal islands in a SiO2 layer | - |
dc.type | Article | - |
dc.identifier.doi | 10.1063/1.2450650 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.90, no.5 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 90 | - |
dc.citation.number | 5 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000243977300035 | - |
dc.identifier.scopusid | 2-s2.0-33846981859 | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | QUANTUM-DOT | - |
dc.subject.keywordPlus | SILICON NANOCRYSTALS | - |
dc.subject.keywordPlus | ROOM-TEMPERATURE | - |
dc.subject.keywordPlus | COULOMB-BLOCKADE | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | TRANSISTORS | - |
dc.subject.keywordPlus | MICROSCOPE | - |
dc.subject.keywordPlus | SYSTEM | - |
dc.subject.keywordPlus | MEMORY | - |
dc.subject.keywordPlus | FIELD | - |
dc.subject.keywordAuthor | Zn | - |
dc.subject.keywordAuthor | nanocrystal | - |
dc.subject.keywordAuthor | electron beam | - |
dc.subject.keywordAuthor | SiO2 | - |
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