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dc.contributor.authorKim, J. M.-
dc.contributor.authorPark, C. Y.-
dc.contributor.authorLee, Y. T.-
dc.contributor.authorSong, J. D.-
dc.date.accessioned2024-01-21T01:36:32Z-
dc.date.available2024-01-21T01:36:32Z-
dc.date.created2022-01-11-
dc.date.issued2006-12-15-
dc.identifier.issn0022-0248-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/134813-
dc.description.abstractHighly tensile-strained (TS) InGaAs/lattice-matched (LM) InGaAlAs MQWs for 1.3 mu m emission wavelength were grown by MBE and their properties were characterized by photolurninescence (PL) measurements and cross-sectional transmission electron microscopy (TEM). The energy band of the TS-InGaAs/LM-InGaAlAs MQW was theoretically calculated using a 6 x 6 Luttinger-Kohn Hamiltonian. The tensile strains for the wells were varied from 1.0% to 1.5%, while lattice match was used for barriers. The wells and barriers have well-defined interfaces for TS-InGaAs/LM-InGaAlAs MQWs with a tensile strain (epsilon) of 1.0% and 1.25%, respectively. However, significant non-planarity between wells and barriers was observed for TS-InGaAs/LM-InGaAlAs MQWs with a tensile strain of 1.5%. For epsilon = 1.0%, 1.25%, and 1.5%, two peaks were observed in each PL spectrum. The longer wavelength peak is attributed to an electron-light hole (E1-LH1) transition while the shorter wavelength peak to an electron-heavy hole (E1-HH1) transition. While the E1-HH1 transition is dominant at epsilon = 1.0%, the E1-LH1 transition is dominant at - = 1.25% and 1.5%. The E1-LH1 transition was clearly observed with increasing well number. The total PL intensity increased as the well number increased from 1 to 4 QWs. However, the total PL intensity decreased with 5 QWs. Therefore, the maximum well number is limited to 4, constituting a compromise between well number and strain relaxation. (c) 2006 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE BV-
dc.subjectLASERS-
dc.titleMBE growth and optical properties of highly tensile-strained In1-xGaxAs/In-0.52(Ga0.4Al0.6)(0.48)As multi-quantum-wells using digital alloy-
dc.typeArticle-
dc.identifier.doi10.1016/j.jcrysgro.2006.09.024-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF CRYSTAL GROWTH, v.297, no.1, pp.52 - 56-
dc.citation.titleJOURNAL OF CRYSTAL GROWTH-
dc.citation.volume297-
dc.citation.number1-
dc.citation.startPage52-
dc.citation.endPage56-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000243252500010-
dc.identifier.scopusid2-s2.0-37849186140-
dc.relation.journalWebOfScienceCategoryCrystallography-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaCrystallography-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusLASERS-
dc.subject.keywordAuthormolecular beam epitaxy-
dc.subject.keywordAuthorquantum wells-
dc.subject.keywordAuthorsemiconducting III-V materials-
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