Residue-free nanofilling with wetting solutions

Authors
Kim, Tae-ilKwon, S. JoonLee, JiyeonLee, Hong H.
Issue Date
2006-10-23
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.89, no.17
Abstract
The stability of a liquid filament between two surfaces is utilized to fill nanochannels with no residue on the rest of the top surface. The stability condition is that the average contact angle of the liquid with the surfaces is less than 45 degrees. This condition means that a liquid that wets a surface can be used, which contrasts earlier results where liquids that readily dewet a surface are required for the filling. Experimental results are presented for filling nanochannels selectively with sol-gel solutions. (c) 2006 American Institute of Physics.
Keywords
THIN POLYMER-FILMS; LITHOGRAPHY; THIN POLYMER-FILMS; LITHOGRAPHY; Residue; Nanofilling; Wetting; Solution; Patterning
ISSN
0003-6951
URI
https://pubs.kist.re.kr/handle/201004/135020
DOI
10.1063/1.2364845
Appears in Collections:
KIST Article > 2006
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