Capillarity-assisted fabrication of nanostructures using a less permeable mold for nanotribological applications

Authors
Suh, Kahp Y.Jeong, Hoon EuiKim, Deok-HoSingh, R. ArvindYoon, Eui-Sung
Issue Date
2006-08-01
Publisher
AMER INST PHYSICS
Citation
JOURNAL OF APPLIED PHYSICS, v.100, no.3
Abstract
A simple kinetic model is presented to describe the capillary rise of a thin polymer film into a less permeable polyurethane acrylate mold. In this model, capillarity is explained by the competition between capillary and hydrodynamic forces in the course of pattern formation. For a less permeable mold, it was found that the capillary rise increases linearly with time. In addition, the contribution of viscosity and film thickness disappears such that the kinetics is solely governed by the permeation kinetics and capillary force. The present model would be useful to describe the evolution of molded nanostructures when a less permeable mold material other than polydimethylsiloxane is used for the patterning. Moreover, nanostructures with different tip shapes (rounded or dimpled) were observed depending on the fabrication temperature. The structures were tested for potential nanotribological applications such as reduction in adhesive and friction forces. (c) 2006 American Institute of Physics.
Keywords
FORCE LITHOGRAPHY; SOFT; MICROSTRUCTURES; POLYURETHANE; RESOLUTION; STABILITY; POLYMERS; STAMPS; FORCE LITHOGRAPHY; SOFT; MICROSTRUCTURES; POLYURETHANE; RESOLUTION; STABILITY; POLYMERS; STAMPS; Lithography; Capillary; Nanostructure; tribology; nano
ISSN
0021-8979
URI
https://pubs.kist.re.kr/handle/201004/135248
DOI
10.1063/1.2222071
Appears in Collections:
KIST Article > 2006
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