Successive ionic layer adsorption and reaction (SILAR) trend for nanocrystalline mercury sulfide thin films growth

Authors
Patil, RSLokhande, CDMane, RSPathan, HMJoo, OSHan, SH
Issue Date
2006-04-15
Publisher
ELSEVIER SCIENCE SA
Citation
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, v.129, no.1-3, pp.59 - 63
Abstract
Mercury sulfide (HgS)nanocrystalline thin films have been grown onto amorphous glass substrate by successive ionic layer adsorption and reaction (SILAR) trend at room temperature (27 degrees C). The optimized preparative parameters including ion concentration, number of immersion cycles, and pH of the solution are used for fine nanocrystalline film growth. A further study has been made for the structural, surface morphological, optical and electrical properties of the films by using X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), optical absorption and dc two point probe method. The as-deposited grown HgS nanocrystalline films exhibited cubic phase, with optical band gap (E-g) of 2.0eV and electrical resistivity of the order of 10(3) Omega cm. SEM and TEM images confirmed films of smooth surface morphology and nanocrystaline in nature with fine crystallites of 20-30 nm diameter, respectively. (c) 2006 Elsevier B.V. All rights reserved.
Keywords
HGS FILMS; CHEMICAL-DEPOSITION; BATH; HGS FILMS; CHEMICAL-DEPOSITION; BATH; mercury sulfide; SILAR; film growth; surface morphological studies; optical and electrical properties
ISSN
0921-5107
URI
https://pubs.kist.re.kr/handle/201004/135583
DOI
10.1016/j.mseb.2005.12.027
Appears in Collections:
KIST Article > 2006
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