Electrodeposition of TiO2 and RuO2 thin films for morphology-dependent applications
- Authors
- Lokhande, CD; Park, BO; Park, HS; Jung, KD; Joo, OS
- Issue Date
- 2005-11
- Publisher
- ELSEVIER SCIENCE BV
- Citation
- ULTRAMICROSCOPY, v.105, no.1-4, pp.267 - 274
- Abstract
- TiO2 and RuO2 have many applications in the field of photocatalysis, environmental protection, high charge storage capacity devices etc. In the present investigation, nanocrystalline TiO2 and RuO2 thin films have been electrodeposited from aqueous baths. The morphological studies of these films have been carried out using scanning electron microscopy and transmission electron microscopy. The morphology of these films and their device performance are closely related. The TiO2 films showed a compact morphology, useful in covering CdSe semiconductor in photoelectrochernical cells. The porous morphology of RuO2 film is useful in improving supercapacitor performance. (c) 2005 Elsevier B.V. All rights reserved.
- Keywords
- HYDROUS RUTHENIUM OXIDE; ELECTROCHEMICAL CAPACITORS; CATHODIC ELECTROSYNTHESIS; DEPOSITION; TITANIUM; HYDROUS RUTHENIUM OXIDE; ELECTROCHEMICAL CAPACITORS; CATHODIC ELECTROSYNTHESIS; DEPOSITION; TITANIUM; TiO2; RuO2; electrodeposition; morphology; photoelectrochemical cells; supercapacitors
- ISSN
- 0304-3991
- URI
- https://pubs.kist.re.kr/handle/201004/136029
- DOI
- 10.1016/j.ultramic.2005.06.048
- Appears in Collections:
- KIST Article > 2005
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