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dc.contributor.authorJung, YC-
dc.contributor.authorAn, SY-
dc.contributor.authorSuh, SH-
dc.contributor.authorChoi, DK-
dc.contributor.authorKim, JS-
dc.date.accessioned2024-01-21T04:38:42Z-
dc.date.available2024-01-21T04:38:42Z-
dc.date.created2021-09-03-
dc.date.issued2005-07-01-
dc.identifier.issn0040-6090-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/136292-
dc.description.abstractThe semiconductor-passivating layer interface, as well as the dielectric properties of the passivants, plays an important role in HgCdTe based photodiodes. ZnS is a commonly used surface passivant for HgCdTe. This study examined the effects of sulfidation on the HgCdTe surface and interfacial characteristics of metal/ZnS/HgCdTe structures. The ZnS layer was deposited by thermal evaporation after sulfidation. The interfacial properties of the metal insulator semiconductor (MIS) structures were determined. A comparison of an untreated capacitor and a sulfide treated MIS capacitor showed that the fixed charge density (untreated 6.37 x 10(11), treated 3.2 x 10(11) cm(-2)) and slow state density (untreated 5.5 x 10(11), treated 7.5 x 10(10) cm(-2)) were 2 and 7 times lower in the treated than in the untreated specimens. Sulfidation results in a decrease in the concentration of contaminants originating from the native oxide-covered HgCdTe substrates. This reduction may be due to the formation of S-S or II-S bonds at the surface layer. These bonds might act as barriers against native oxide formation when (NH4)(2)S-x-treated HgCdTe substrates are exposed to air. (c) 2004 Published by Elsevier B.V.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectZNS-
dc.titleAmmonium sulfide treatment of HgCdTe substrate and its effects on electrical properties of ZnS/HgCdTe heterostructure-
dc.typeArticle-
dc.identifier.doi10.1016/j.tsf.2004.12.057-
dc.description.journalClass1-
dc.identifier.bibliographicCitationTHIN SOLID FILMS, v.483, no.1-2, pp.407 - 410-
dc.citation.titleTHIN SOLID FILMS-
dc.citation.volume483-
dc.citation.number1-2-
dc.citation.startPage407-
dc.citation.endPage410-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000229681700066-
dc.identifier.scopusid2-s2.0-18844377131-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusZNS-
dc.subject.keywordAuthorZnS-
dc.subject.keywordAuthormetal-insulator-semiconductor-
dc.subject.keywordAuthorsurface and interface states-
dc.subject.keywordAuthorinterface-
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KIST Article > 2005
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