Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Jung, YC | - |
dc.contributor.author | An, SY | - |
dc.contributor.author | Suh, SH | - |
dc.contributor.author | Choi, DK | - |
dc.contributor.author | Kim, JS | - |
dc.date.accessioned | 2024-01-21T04:38:42Z | - |
dc.date.available | 2024-01-21T04:38:42Z | - |
dc.date.created | 2021-09-03 | - |
dc.date.issued | 2005-07-01 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/136292 | - |
dc.description.abstract | The semiconductor-passivating layer interface, as well as the dielectric properties of the passivants, plays an important role in HgCdTe based photodiodes. ZnS is a commonly used surface passivant for HgCdTe. This study examined the effects of sulfidation on the HgCdTe surface and interfacial characteristics of metal/ZnS/HgCdTe structures. The ZnS layer was deposited by thermal evaporation after sulfidation. The interfacial properties of the metal insulator semiconductor (MIS) structures were determined. A comparison of an untreated capacitor and a sulfide treated MIS capacitor showed that the fixed charge density (untreated 6.37 x 10(11), treated 3.2 x 10(11) cm(-2)) and slow state density (untreated 5.5 x 10(11), treated 7.5 x 10(10) cm(-2)) were 2 and 7 times lower in the treated than in the untreated specimens. Sulfidation results in a decrease in the concentration of contaminants originating from the native oxide-covered HgCdTe substrates. This reduction may be due to the formation of S-S or II-S bonds at the surface layer. These bonds might act as barriers against native oxide formation when (NH4)(2)S-x-treated HgCdTe substrates are exposed to air. (c) 2004 Published by Elsevier B.V. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | ZNS | - |
dc.title | Ammonium sulfide treatment of HgCdTe substrate and its effects on electrical properties of ZnS/HgCdTe heterostructure | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.tsf.2004.12.057 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | THIN SOLID FILMS, v.483, no.1-2, pp.407 - 410 | - |
dc.citation.title | THIN SOLID FILMS | - |
dc.citation.volume | 483 | - |
dc.citation.number | 1-2 | - |
dc.citation.startPage | 407 | - |
dc.citation.endPage | 410 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000229681700066 | - |
dc.identifier.scopusid | 2-s2.0-18844377131 | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | ZNS | - |
dc.subject.keywordAuthor | ZnS | - |
dc.subject.keywordAuthor | metal-insulator-semiconductor | - |
dc.subject.keywordAuthor | surface and interface states | - |
dc.subject.keywordAuthor | interface | - |
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