Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Shin, SD | - |
dc.contributor.author | Kim, DW | - |
dc.contributor.author | Kim, DK | - |
dc.contributor.author | Kim, DY | - |
dc.date.accessioned | 2024-01-21T05:34:20Z | - |
dc.date.available | 2024-01-21T05:34:20Z | - |
dc.date.created | 2021-09-01 | - |
dc.date.issued | 2005-02-01 | - |
dc.identifier.issn | 0022-0248 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/136752 | - |
dc.description.abstract | In this study. the microstructure and property of poly-Si film, deposited using hot wire chemical vapor deposition (HWCVD) were investigated. A consequence of the low a-Si content in the poly-Si film was crystallites with well developed facets. The crystallite morphology was rhombic pyramidal while EBSD analysis revealed the existence of (1 1 1) contact twin planes. The facets of the rhombic pyramidal crystallites were based oil {3 2 0} and {3 2 0}* planes, which have Sigma3 twin relationship with respect to (1 1 1) contact twin plane. (C) 2004 Published by Elsevier B.V. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | FLATTENED DIAMOND CRYSTALS | - |
dc.subject | HOT-WIRE CVD | - |
dc.subject | MICROCRYSTALLINE SILICON | - |
dc.subject | SOLAR-CELLS | - |
dc.subject | SI | - |
dc.subject | MECHANISM | - |
dc.title | Crystal growth in the low-temperature deposition of polycrystalline silicon thin film | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.jcrysgro.2004.10.151 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JOURNAL OF CRYSTAL GROWTH, v.274, no.3-4, pp.347 - 354 | - |
dc.citation.title | JOURNAL OF CRYSTAL GROWTH | - |
dc.citation.volume | 274 | - |
dc.citation.number | 3-4 | - |
dc.citation.startPage | 347 | - |
dc.citation.endPage | 354 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000226704900003 | - |
dc.relation.journalWebOfScienceCategory | Crystallography | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Crystallography | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | FLATTENED DIAMOND CRYSTALS | - |
dc.subject.keywordPlus | HOT-WIRE CVD | - |
dc.subject.keywordPlus | MICROCRYSTALLINE SILICON | - |
dc.subject.keywordPlus | SOLAR-CELLS | - |
dc.subject.keywordPlus | SI | - |
dc.subject.keywordPlus | MECHANISM | - |
dc.subject.keywordAuthor | EBSD | - |
dc.subject.keywordAuthor | rhombic pyramid | - |
dc.subject.keywordAuthor | twin | - |
dc.subject.keywordAuthor | HWCVD | - |
dc.subject.keywordAuthor | poly-Si | - |
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