Ion scattering Spectroscopy study of Si(001)c(4 x 4)-C surface reconstruction

Authors
Park, JYSeo, JHKim, JYWhang, CNKim, SSChoi, DSChae, KH
Issue Date
2004-09
Publisher
KOREAN PHYSICAL SOC
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.45, no.3, pp.614 - 618
Abstract
Reconstructed Si(001)c(4 x 4)-C surface has been studied by coaxial impact collision ion scattering spectroscopy (CAICISS). When 100L ethylene (C2H4) was exposed on Si(001.)-(2 x 1) surface at 700 degreesC, Si(001) dimer structures were changed by induced carbon (C) atoms. The experimental CAICISS spectra and simulation results reveal that the reconstructed Si(001)c(4 x 4)-C surface shows good agreement with the missing dimer model, rather than the Si-C heterodimer model, and adsorbed C atoms influence only the reconstructed vertical plane of Si(001) surface. On comparing the azimuthal-scan curves for 100L C/Si(001) with those for clean Si(001), it can be suggested that C atoms occupy the fourth subsurface layer of Si(001) directly below the HB (bridge) site. These results are new evidence supporting the previous studies based on the C incorporation into Si(001) surface with missing dimers and the substitution of the fourth Si layers.
Keywords
ATOMIC-STRUCTURE; SI(100); GROWTH; PHASES; ATOMIC-STRUCTURE; SI(100); GROWTH; PHASES; surface structure; reconstruction; silicon; carbon; low-energy ion scattering (LEIS)
ISSN
0374-4884
URI
https://pubs.kist.re.kr/handle/201004/137293
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KIST Article > 2004
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