저압 나노여과 공정에서의 유해성 유기물질의 거동
- Other Titles
- Behavior of Hazardous Organic Compounds in Low-Pressure Nanofiltration Process
- Authors
- 오정익; 이석헌; 이보영
- Issue Date
- 2004-04
- Publisher
- 대한상하수도학회
- Citation
- 상하수도학회지, v.18, no.2, pp.165 - 173
- Abstract
- Behavior of hazardous organic compounds including bisphenol A, phtalic acid, and phosphoric acid in low-pressure nanofiltration process were investigated. In the case of NTR729HF, rejection of all target organic compounds except 2-H-Benzothiazol and 2-isopropyl phenol was more than 90%. The lowest rejection for 2-H-Benzothiazol was observed in another membranes. The UTC60 and UTC20 showed similar rejection characteristics of hazardous organic compounds. Although the rejection of Bisphenol A, n-buthyl benzenesulfoneamide, N-ethyl-p-toluensulfonamide, 2-H-benzothiazol, p-t-butylphenol and 2-isopropyl phenol was less than 30%, the rejection of tributyl phosphate, triethyl phosphate, camphor, 2,2,4 trimethyl 1,3 pentandiol and diphenyl amine was more than 90% in the case of UTC60 and UTC20. The rejection characteristics of various hazardous organic compounds were converted into one parameter Ks, which was proposed in the diffusion-convection model. The Ks of hazardous organic compounds were discussed by comparing with their solute size represented by Stokes radius. The diffusion-convection model considering Ks was successful to interpret rejection characteristics of hazardous organic compounds by low-pressure nanofiltration membranes. KEYWORDS; Nanofiltration, hazardous organic compounds, diffusion, convection
- Keywords
- 나노여과; 유해성 유기 물질; 확산; 이류
- ISSN
- 1225-7672
- URI
- https://pubs.kist.re.kr/handle/201004/137699
- Appears in Collections:
- KIST Article > 2004
- Files in This Item:
There are no files associated with this item.
- Export
- RIS (EndNote)
- XLS (Excel)
- XML
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.