Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Son, JH | - |
dc.contributor.author | Kim, HB | - |
dc.contributor.author | Whang, CN | - |
dc.contributor.author | Sung, MC | - |
dc.contributor.author | Jeong, K | - |
dc.contributor.author | Im, S | - |
dc.contributor.author | Chae, KH | - |
dc.date.accessioned | 2024-01-21T07:38:31Z | - |
dc.date.available | 2024-01-21T07:38:31Z | - |
dc.date.created | 2021-09-02 | - |
dc.date.issued | 2004-02 | - |
dc.identifier.issn | 0168-583X | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/137912 | - |
dc.description.abstract | The SiO2/Si (3 nm)/SiO2 layers were deposited by e-beam evaporation, and ion-beam-mixing was performed with 1.5 x 10(16) ions/cm(2) of 55 keV at room temperature. The sample deposited by e-beam evaporation needs the pre-annealing before ion-beam-mixing as well as the post-annealing after ion-beam-mixing to obtain the nanocrystal-related photoluminescence, compared with the study of the sample deposited by ion beam sputtering which was not required the pre-annealing before ion-beam-mixing to obtain visible red photoluminescence. The pre-annealing effect on the photoluminescence of Si ion-beam-mixed SiO2/Si (3 nm)/SiO2 layer will be discussed. (C) 2003 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | IMPLANTED SIO2 | - |
dc.subject | LUMINESCENCE | - |
dc.subject | TEMPERATURE | - |
dc.title | Visible photoluminescence from Si ion-beam-mixed SiO2/Si/SiO2 layers deposited by e-beam evaporation | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.nimb.2003.11.059 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, v.216, pp.346 - 349 | - |
dc.citation.title | NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | - |
dc.citation.volume | 216 | - |
dc.citation.startPage | 346 | - |
dc.citation.endPage | 349 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000189222100058 | - |
dc.identifier.scopusid | 2-s2.0-1042277323 | - |
dc.relation.journalWebOfScienceCategory | Instruments & Instrumentation | - |
dc.relation.journalWebOfScienceCategory | Nuclear Science & Technology | - |
dc.relation.journalWebOfScienceCategory | Physics, Atomic, Molecular & Chemical | - |
dc.relation.journalWebOfScienceCategory | Physics, Nuclear | - |
dc.relation.journalResearchArea | Instruments & Instrumentation | - |
dc.relation.journalResearchArea | Nuclear Science & Technology | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.subject.keywordPlus | IMPLANTED SIO2 | - |
dc.subject.keywordPlus | LUMINESCENCE | - |
dc.subject.keywordPlus | TEMPERATURE | - |
dc.subject.keywordAuthor | ion-beam-mixing | - |
dc.subject.keywordAuthor | annealing | - |
dc.subject.keywordAuthor | photoluminescence | - |
dc.subject.keywordAuthor | Si nanocrystal | - |
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