Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, YJ | - |
dc.contributor.author | Koh, EK | - |
dc.contributor.author | Park, CS | - |
dc.contributor.author | Park, IW | - |
dc.contributor.author | Kim, EK | - |
dc.date.accessioned | 2024-01-21T10:37:35Z | - |
dc.date.available | 2024-01-21T10:37:35Z | - |
dc.date.created | 2021-09-01 | - |
dc.date.issued | 2002-05-31 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/139517 | - |
dc.description.abstract | The structural and electrical changes of the thin GaN layer prepared on a (001) GaAs substrate before and after rapid thermal treatment have been investigated by Raman scattering, glancing X-ray diffraction, and current-/capacitance-voltage measurements. Thin GaN layers grown on a (001) GaAs substrate by metal organic chemical vapor deposition were shown to be composed mostly of wurtzite-structured GaN (alpha-phase), whereas zincblende GaN (beta-phase) was present near the interface between the thin GaN layer and the GaAs substrate. Rapid thermal treatment at 750-850 degreesC caused a structural phase of the GaN to evolve; the higher fraction of beta-phase was still maintained at the hetero-interfacial region due to the strong influence of the (001) GaAs matrix. By contrast, several mixed structures of beta-(111) and alpha-(10 (1) over bar1) appeared near the surface of the GaN layer that was farthest from the interface region. After the thermal treatment, the electrical properties of the GaN/GaAs hetero-interface were those of a quasi-metal-insulator-semiconductor. The detailed structural changes and the related electrical characteristics of the thin GaN layer on (001) GaAs are discussed. (C) 2002 Elsevier Science B.V. All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | GROWTH | - |
dc.subject | FILMS | - |
dc.title | Thermal evolution of alpha- and beta-phases in the thin GaN on (001) GaAs | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/S0040-6090(02)00287-0 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | THIN SOLID FILMS, v.411, no.2, pp.229 - 233 | - |
dc.citation.title | THIN SOLID FILMS | - |
dc.citation.volume | 411 | - |
dc.citation.number | 2 | - |
dc.citation.startPage | 229 | - |
dc.citation.endPage | 233 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000177179400009 | - |
dc.identifier.scopusid | 2-s2.0-0346621282 | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordAuthor | nitrides | - |
dc.subject.keywordAuthor | heat treatment | - |
dc.subject.keywordAuthor | X-ray diffraction | - |
dc.subject.keywordAuthor | interface | - |
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