Photolithographic patterning of electrically conducting polypyrrole film

Abstract

The micro-patterns of electrically conducting polypyrrole (PPy) with line width as low as 30 mum have been successfully achieved using a photolithographic method. PPy as a conducting pattern was chemically polymerized within the poly (vinyl alcohol) (PVA) matrix layer where ferric p-toluenesulfonate as an oxidant was embedded in a designed architecture. Surface resistivity and transmittance at 600 nm of PPy regions were in the range of 10(3) similar to 10(5) Ohm/rectangle and 50% similar to 90%, respectively. The resistances of PPy patterns were in the range of 10(4) similar to 10(6) Ohm, which is lower than that of PVA region by about 10(10) times.