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dc.contributor.authorLee, HJ-
dc.contributor.authorSong, JH-
dc.contributor.authorYoon, YS-
dc.contributor.authorKim, TS-
dc.contributor.authorKim, KJ-
dc.contributor.authorChoi, WK-
dc.date.accessioned2024-01-21T11:40:00Z-
dc.date.available2024-01-21T11:40:00Z-
dc.date.created2021-09-05-
dc.date.issued2001-10-15-
dc.identifier.issn0925-4005-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/140106-
dc.description.abstractAn In2O3-based thin film sensor was fabricated on alumina substrate for detecting CO gas and ultra-thin transition metal Co was adsorbed by sputtering and annealed as a surface activator as thick as 0.7-2.4 nm to enhance its sensitivity (S). As the thickness W of Co catalyst layer increased, the sensitivity of Co-In2O3 Sensor for show the highest sensitivity of S = 7.5 at t = 2.1 run at 350 degreesC. For the comparison, C3H8 was used as a test gas of hydrocarbon contained gas and the maximum sensitivity for 1000 PPM C3H8 was S = 13.5 at t = 1.4 mn at 400 degreesC. In consequence, it was found the possibility that CO and C3H8 can be detected without cross-talking by using hybrid type Co-In2O3 sensor. From X-ray photoelectron spectroscopy, adsorbed Co layer was oxidized Coo after 500 degreesC annealing in air and to be covered with Co3O4. Such a formation of Coo (p-type)-In2O3 (n-type) junction was suggested as a main sensing mechanism to explain the enhanced sensitivity of Co-In-In2O3 sensor. (C) 2001 Elsevier Science B.V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectX-RAY-PHOTOELECTRON-
dc.subjectSPECTROSCOPY-
dc.subjectAUGER-
dc.subjectFILM-
dc.subjectTIN-
dc.subjectOXIDATION-
dc.subjectCOPPER-
dc.titleEnhancement of CO sensitivity of indium oxide-based semiconductor gas sensor through ultra-thin cobalt adsorption-
dc.typeArticle-
dc.identifier.doi10.1016/S0925-4005(01)00876-0-
dc.description.journalClass1-
dc.identifier.bibliographicCitationSENSORS AND ACTUATORS B-CHEMICAL, v.79, no.2-3, pp.200 - 205-
dc.citation.titleSENSORS AND ACTUATORS B-CHEMICAL-
dc.citation.volume79-
dc.citation.number2-3-
dc.citation.startPage200-
dc.citation.endPage205-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000171679600019-
dc.identifier.scopusid2-s2.0-0035888351-
dc.relation.journalWebOfScienceCategoryChemistry, Analytical-
dc.relation.journalWebOfScienceCategoryElectrochemistry-
dc.relation.journalWebOfScienceCategoryInstruments & Instrumentation-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaElectrochemistry-
dc.relation.journalResearchAreaInstruments & Instrumentation-
dc.type.docTypeArticle-
dc.subject.keywordPlusX-RAY-PHOTOELECTRON-
dc.subject.keywordPlusSPECTROSCOPY-
dc.subject.keywordPlusAUGER-
dc.subject.keywordPlusFILM-
dc.subject.keywordPlusTIN-
dc.subject.keywordPlusOXIDATION-
dc.subject.keywordPlusCOPPER-
dc.subject.keywordAuthorIn2O3 thin film-
dc.subject.keywordAuthorCO sensor-
dc.subject.keywordAuthorultra-thin Co layer-
dc.subject.keywordAuthorsurface activator-
dc.subject.keywordAuthorp-n junction-
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