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dc.contributor.authorAhn, K.-D.-
dc.contributor.authorHan, D.K.-
dc.contributor.authorKim, J.-Y.-
dc.contributor.authorHa, S.-H.-
dc.contributor.authorLee, D.-Y.-
dc.contributor.authorNam, J.-L.-
dc.date.accessioned2024-01-21T12:05:33Z-
dc.date.available2024-01-21T12:05:33Z-
dc.date.created2021-09-02-
dc.date.issued2001-08-
dc.identifier.issn0914-9244-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/140302-
dc.description.abstract[No abstract available]-
dc.languageEnglish-
dc.publisherTokai University-
dc.subjectflavone-
dc.subjectisoflavone derivative-
dc.subjectpolymer-
dc.subjectabsorption-
dc.subjectarticle-
dc.subjectchromatophore-
dc.subjectlaser-
dc.subjectlithography-
dc.subjectmaterial coating-
dc.subjectstructure analysis-
dc.subjectsurface property-
dc.subjecttechnology-
dc.titleNew antireflective coating materials containing a novel chromophore for KrF laser lithography-
dc.typeArticle-
dc.identifier.doi10.2494/photopolymer.14.475-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJournal of Photopolymer Science and Technology, v.14, no.3, pp.475 - 480-
dc.citation.titleJournal of Photopolymer Science and Technology-
dc.citation.volume14-
dc.citation.number3-
dc.citation.startPage475-
dc.citation.endPage480-
dc.description.journalRegisteredClassscopus-
dc.identifier.scopusid2-s2.0-0035754876-
dc.type.docTypeArticle-
dc.subject.keywordPlusflavone-
dc.subject.keywordPlusisoflavone derivative-
dc.subject.keywordPluspolymer-
dc.subject.keywordPlusabsorption-
dc.subject.keywordPlusarticle-
dc.subject.keywordPluschromatophore-
dc.subject.keywordPluslaser-
dc.subject.keywordPluslithography-
dc.subject.keywordPlusmaterial coating-
dc.subject.keywordPlusstructure analysis-
dc.subject.keywordPlussurface property-
dc.subject.keywordPlustechnology-
dc.subject.keywordAuthorAntireflective coating (ARC)-
dc.subject.keywordAuthorBottom ARC (BARC) materials-
dc.subject.keywordAuthorIsoflavone and flavone chromophores-
dc.subject.keywordAuthorIsoflavone polymers as BARC materials-
dc.subject.keywordAuthorKrF lithography-
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KIST Article > 2001
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