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dc.contributor.author김현정-
dc.contributor.author김긍호-
dc.date.accessioned2024-01-21T13:02:24Z-
dc.date.available2024-01-21T13:02:24Z-
dc.date.created2022-01-10-
dc.date.issued2001-01-
dc.identifier.issn1225-6773-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/140790-
dc.publisher한국전자현미경학회-
dc.titleMeasurements of lattice strain in MOCVD-GaN thin film grown on a sapphire substrate treated by reactive ion beam.-
dc.title.alternative활성화 이온빔 처리된 sapphire 기판 위에 성장시킨 MOCVD-GaN 박막의 격자변형량 측정-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국전자현미경학회지, v.30, no.4, pp.337 - 345-
dc.citation.title한국전자현미경학회지-
dc.citation.volume30-
dc.citation.number4-
dc.citation.startPage337-
dc.citation.endPage345-
dc.subject.keywordAuthorGaN-
dc.subject.keywordAuthorHOLZ-
dc.subject.keywordAuthorreactive ion beam-
dc.subject.keywordAuthorsapphire substrate-
dc.subject.keywordAuthorlattice strain-
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KIST Article > 2001
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