DSpace at KIST: A prediction method of temperature distribution on the wafer in a rapid thermal process system with multipoint sensing

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DC Field	Value	Language
dc.contributor.author	심영렬	-
dc.contributor.author	이석주	-
dc.contributor.author	민병조	-
dc.contributor.author	조영조	-
dc.contributor.author	김학배	-
dc.date.accessioned	2024-01-21T14:31:20Z	-
dc.date.available	2024-01-21T14:31:20Z	-
dc.date.created	2022-01-10	-
dc.date.issued	2000-02	-
dc.identifier.issn	1229-6287	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/141592	-
dc.publisher	대한전기학회	-
dc.title	A prediction method of temperature distribution on the wafer in a rapid thermal process system with multipoint sensing	-
dc.title.alternative	고속 열처리 시스템에서 웨이퍼 상의 다중점 계측에 의한 온도 분포 추정 기법 연구	-
dc.type	Article	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	전기학회논문지 D = Transactions of the Korean Institute of Electrical Engneers, v.49, no.2, pp.62 - 67	-
dc.citation.title	전기학회논문지 D = Transactions of the Korean Institute of Electrical Engneers	-
dc.citation.volume	49	-
dc.citation.number	2	-
dc.citation.startPage	62	-
dc.citation.endPage	67	-
dc.subject.keywordAuthor	rapid thermal process	-
dc.subject.keywordAuthor	thermal modeling	-
dc.subject.keywordAuthor	tempertaure estimation	-
dc.subject.keywordAuthor	chamber geometry	-
dc.subject.keywordAuthor	run-by-run control	-

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