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dc.contributor.author송재훈-
dc.contributor.author김기환-
dc.contributor.author이충만-
dc.contributor.author최성창-
dc.contributor.author송종한-
dc.contributor.author정형진-
dc.contributor.author최원국-
dc.date.accessioned2024-01-21T15:34:47Z-
dc.date.available2024-01-21T15:34:47Z-
dc.date.created2022-01-10-
dc.date.issued1999-05-
dc.identifier.issn1225-8822-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/142209-
dc.languageKorean-
dc.publisher한국진공학회-
dc.title동심원형 대칭 전기장 집속 방식을 응용한 자가 이온 보조 소스 제작 및 Cu 박막 증착-
dc.title.alternativeDesign of self-ion assisted beam source (SIAB) based on electron focusing with concentric symmetrical electric field and Cu thin film growth by SIAB-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitation한국진공학회지, v.8, no.2, pp.121 - 126-
dc.citation.title한국진공학회지-
dc.citation.volume8-
dc.citation.number2-
dc.citation.startPage121-
dc.citation.endPage126-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassother-
dc.subject.keywordAuthorself-ion assisted beam source-
dc.subject.keywordAuthorunvala scheme-
dc.subject.keywordAuthorelectrostatic focusing-
dc.subject.keywordAuthorCu thin film-
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