Surface reaction on polyvinylidenefluoride (PVDF) irradiated by low energy ion beam in reactive gas environment

Abstract

Polyvinylidenefluoride (PVDF) was irradiated by a keV Ar+ ion in O-2 environment for improving adhesion between PVDF and Pt, and reaction between PVDF and the ion beam has been investigated by X-ray photoelectron spectroscopy (XPS). The adhesion test between Pt and the modified PVDF was carried out by boiling test, in which the specimens were kept in boiling water for 4 h. Two failure modes (buckling up due to weak adhesion and crack formation due to strong adhesion) of Pt films have been observed in the system. Contact angle of PVDF was reduced to 31 from 75 degrees by the irradiation of 1 x 10(15) Ar+ ions/cm(2) with oxygen flow rate of 8 seem. The surface of the irradiated PVDF became more rough as ion dose increased. The improved adhesion mechanism and identification of newly formed chemical species have been confirmed by Carbon Is and Fluorine Is X-ray photoelectron core-level spectra. The main reaction occurred at the irradiated PVDF surface is an ion-beam-induced oxidation accompanied with preferential sputtering of fluorine. Newly formed chemical species at interface are regarded as ester and carboxyl groups. Adhesion of the Pt-PVDF interface was improved by ion irradiation in O-2 environment. This improvement is originated from the presence of carbon-oxygen bonds on the irradiated PVDF surface. Comparison of failure modes on the irradiated PVDF at various conditions after the boiling test shows that adhesion of Pt film is largely affected by the product of ion-assisted reaction. (C) 1999 John Wiley & Sons, Inc.