DSpace at KIST: The formation and phase analysis of Ni-Si diffusion layers formed by gas siliconizing of nickel

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DC Field	Value	Language
dc.contributor.author	윤진국	-
dc.contributor.author	고흥석	-
dc.contributor.author	김재수	-
dc.contributor.author	최종술	-
dc.date.accessioned	2024-01-21T16:01:03Z	-
dc.date.available	2024-01-21T16:01:03Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1999-02	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/142422	-
dc.language	Korean	-
dc.publisher	대한금속학회	-
dc.title	The formation and phase analysis of Ni-Si diffusion layers formed by gas siliconizing of nickel	-
dc.title.alternative	Ni의 gas siliconizing 에 의한 Ni-Si 확산층의 형성과 상분석	-
dc.type	Article	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	대한금속학회지, v.37, no.2, pp.211 - 219	-
dc.citation.title	대한금속학회지	-
dc.citation.volume	37	-
dc.citation.number	2	-
dc.citation.startPage	211	-
dc.citation.endPage	219	-
dc.description.isOpenAccess	N	-
dc.description.journalRegisteredClass	other	-
dc.subject.keywordAuthor	nickel	-

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