Synthesis and properties of silicon-containing maleimide polymers based on N-(trimethylsilyl) maleimide

Abstract

N-(Trimethylsilyl)maleimide (TMSMI) has been polymerized with various styrenic monomers (XSt) in the presence of a radical initiator to give high-molecular-weight, alternating copolymers in high yields. The copolymers P(TMSMI/XSt) have high glass transition temperatures above 200 degrees C and thermal decomposition temperatures in the range 320-360 degrees C. The thermal and acidolytic deprotection of trimethylsilyl (TMS) groups of TMSMI units in the copolymers have been investigated. UV irradiation and subsequent heating of a film of P(TMSMI/t-BOCSt) containing a photoacid generator resulted in deprotection of the protecting groups by the photogenerated acids, thereby causing a significant change in solubility of the polymer. Thus positive image patterns were obtained with P(TMSMI/t-BOCSt) by photolithographic processes. (C) 1998 Society of Chemical Industry.