Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jung, JH | - |
dc.contributor.author | Ju, BK | - |
dc.contributor.author | Kim, H | - |
dc.contributor.author | Lee, YH | - |
dc.contributor.author | Chung, SJ | - |
dc.contributor.author | Jang, J | - |
dc.contributor.author | Oh, MH | - |
dc.date.accessioned | 2024-01-21T16:39:12Z | - |
dc.date.available | 2024-01-21T16:39:12Z | - |
dc.date.created | 2021-09-03 | - |
dc.date.issued | 1998-10 | - |
dc.identifier.issn | 0018-9383 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/142845 | - |
dc.description.abstract | We have studied the electron emission characteristics of Mo field emitter arrays (FEA's) using a diamond-like carbon (DLC) film deposited by a layer-by-layer technique using plasma enhanced chemical vapor deposition. The turn-on voltage was lowered from 55 to 30 V by a 20-nm thick hydrogen-free DLC coating and maximum emission current was increased from 166 to 831 mu A. Also the gate voltage required to get the anode current of 0.1 (mu A/emitter) decreases from 77 to 48 V. Furthermore, the emission current from DLC coated Mo FEA's is more stable than that of noncoated Mo FEA's. | - |
dc.language | English | - |
dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | FILM | - |
dc.subject | TIPS | - |
dc.title | Effect of diamond-like carbon coating on the emission characteristics of molybdenum field emitter arrays | - |
dc.type | Article | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | IEEE TRANSACTIONS ON ELECTRON DEVICES, v.45, no.10, pp.2232 - 2237 | - |
dc.citation.title | IEEE TRANSACTIONS ON ELECTRON DEVICES | - |
dc.citation.volume | 45 | - |
dc.citation.number | 10 | - |
dc.citation.startPage | 2232 | - |
dc.citation.endPage | 2237 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000076221300019 | - |
dc.identifier.scopusid | 2-s2.0-0032186897 | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | FILM | - |
dc.subject.keywordPlus | TIPS | - |
dc.subject.keywordAuthor | emission current | - |
dc.subject.keywordAuthor | emission stability | - |
dc.subject.keywordAuthor | hydrogen-free DLC | - |
dc.subject.keywordAuthor | Mo FEA&apos | - |
dc.subject.keywordAuthor | s PECVD | - |
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