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dc.contributor.author윤진국-
dc.contributor.author윤호상-
dc.contributor.author김희수-
dc.contributor.author백영현-
dc.contributor.author김재수-
dc.date.accessioned2024-01-21T16:40:16Z-
dc.date.available2024-01-21T16:40:16Z-
dc.date.created2022-01-10-
dc.date.issued1998-09-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/142863-
dc.publisher대한금속학회-
dc.titleEffects of Cl/H input ratio on the chemical vapor deposition rate of silicon on molybdenum substrate-
dc.title.alternativeMo 기판위에서 Si의 화학증착속도에 미치는 Cl/H 주입비의 영향-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitation대한금속학회지, v.36, no.9, pp.1461 - 1469-
dc.citation.title대한금속학회지-
dc.citation.volume36-
dc.citation.number9-
dc.citation.startPage1461-
dc.citation.endPage1469-
dc.subject.keywordAuthorkinetics-
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