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dc.contributor.authorJang, JW-
dc.contributor.authorCho, WJ-
dc.contributor.authorHahn, TS-
dc.contributor.authorChoi, SS-
dc.contributor.authorChung, SJ-
dc.date.accessioned2024-01-21T17:40:02Z-
dc.date.available2024-01-21T17:40:02Z-
dc.date.created2022-01-10-
dc.date.issued1998-01-
dc.identifier.issn0015-0193-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/143403-
dc.description.abstractThickness dependence of ferroelectric and structural properties of BaTiO3 thin films was investigated. BaTiO3 thin films were prepared by rf magnetron sputtering on polycrystalline Pt substrates at 700 degrees C. Film thickness range was 2,100-20,000 Angstrom. Room temperature permittivity, and D-E hysteresis loops were measured as a function of the him thickness. It has been found that these properties had the strong dependence on film thickness, which has mainly due to grain sizes of BaTiO3 thin films. The variation in permittivity according to grain size was discussed in terms of crystallinity, film stress, and recrystallization process.-
dc.languageEnglish-
dc.publisherTAYLOR & FRANCIS LTD-
dc.subjectSTRESSES-
dc.titleThe investigations of dielectric and structural properties of polycrystalline BaTiO3 thin films on Pt substrates by RF magnetron sputtering-
dc.typeArticle-
dc.identifier.doi10.1080/00150199808228386-
dc.description.journalClass1-
dc.identifier.bibliographicCitationFERROELECTRICS, v.205, no.1-4, pp.37 - 48-
dc.citation.titleFERROELECTRICS-
dc.citation.volume205-
dc.citation.number1-4-
dc.citation.startPage37-
dc.citation.endPage48-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000072188400005-
dc.identifier.scopusid2-s2.0-0031676071-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusSTRESSES-
dc.subject.keywordAuthorBaTiO//3 thin film-
dc.subject.keywordAuthorrf magnetron sputtering-
dc.subject.keywordAuthorPt substrate-
dc.subject.keywordAuthorpolycrystalline thin film-
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