Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Kim, ST | - |
dc.contributor.author | Kim, JB | - |
dc.contributor.author | Chung, CM | - |
dc.contributor.author | Ahn, KD | - |
dc.date.accessioned | 2024-01-21T17:42:44Z | - |
dc.date.available | 2024-01-21T17:42:44Z | - |
dc.date.created | 2021-09-04 | - |
dc.date.issued | 1997-12-26 | - |
dc.identifier.issn | 0021-8995 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/143449 | - |
dc.description.abstract | A new silicon-containing maleimide monomer, N-(tert-butyldimethylsilyloxy) maleimide (SiOMI) has been synthesized. SiOMI was radically copolymerized with styrene derivatives (XSt) to obtain alternating copolymers, P(SiOMI/XSt), in high conversions. The copolymers have high glass transition temperatures above 190 degrees C, and the tert-butyldimethylsilyloxy groups are thermally stable up to 300 degrees C. The SiOMI units in the copolymers were converted into N-hydroxymaleimide (HOMI) units by acidolytic deprotection of the tert-butyldimethylsilyloxy protecting groups. The facile deprotection of the side-chain tert-butyldimethylsilyloxy groups from the protected copolymers provided a significant change in solubility of the polymers due to the large polarity change. Submicron positive-tone images were obtained from the copolymers containing an onium salt as a photoacid generator by irradiation with electron beam and development with alkaline solutions. The polymer films also showed very high oxygen plasma etch resistance compared with novolac resins. The silicon-containing maleimide polymers were found to have required properties, such as good alkaline solubility after deprotection, superior adhesion, low optical density, high thermal stability with high T-g, and high plasma etch resistance for applications as deep ultraviolet and electron beam resist materials. (C) 1997 John Wiley & Sons, Inc. | - |
dc.language | English | - |
dc.publisher | JOHN WILEY & SONS INC | - |
dc.subject | TRIARYLSULFONIUM | - |
dc.subject | SALTS | - |
dc.title | Polymerization of N-(tert-butyldimethylsilyloxy)maleimide and applications of the polymers as resist materials | - |
dc.type | Article | - |
dc.identifier.doi | 10.1002/(SICI)1097-4628(19971226)66:13<2507::AID-APP13>3.3.CO;2-Y | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JOURNAL OF APPLIED POLYMER SCIENCE, v.66, no.13, pp.2507 - 2516 | - |
dc.citation.title | JOURNAL OF APPLIED POLYMER SCIENCE | - |
dc.citation.volume | 66 | - |
dc.citation.number | 13 | - |
dc.citation.startPage | 2507 | - |
dc.citation.endPage | 2516 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | A1997YH52400013 | - |
dc.identifier.scopusid | 2-s2.0-85085782779 | - |
dc.relation.journalWebOfScienceCategory | Polymer Science | - |
dc.relation.journalResearchArea | Polymer Science | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | TRIARYLSULFONIUM | - |
dc.subject.keywordPlus | SALTS | - |
dc.subject.keywordAuthor | N-(tert-butyldimethylsilyloxy)maleimide | - |
dc.subject.keywordAuthor | silicon-containing maleimide polymers | - |
dc.subject.keywordAuthor | acidolytic deprotection | - |
dc.subject.keywordAuthor | resist materials | - |
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