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dc.contributor.authorKim, ST-
dc.contributor.authorKim, JB-
dc.contributor.authorChung, CM-
dc.contributor.authorAhn, KD-
dc.date.accessioned2024-01-21T17:42:44Z-
dc.date.available2024-01-21T17:42:44Z-
dc.date.created2021-09-04-
dc.date.issued1997-12-26-
dc.identifier.issn0021-8995-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/143449-
dc.description.abstractA new silicon-containing maleimide monomer, N-(tert-butyldimethylsilyloxy) maleimide (SiOMI) has been synthesized. SiOMI was radically copolymerized with styrene derivatives (XSt) to obtain alternating copolymers, P(SiOMI/XSt), in high conversions. The copolymers have high glass transition temperatures above 190 degrees C, and the tert-butyldimethylsilyloxy groups are thermally stable up to 300 degrees C. The SiOMI units in the copolymers were converted into N-hydroxymaleimide (HOMI) units by acidolytic deprotection of the tert-butyldimethylsilyloxy protecting groups. The facile deprotection of the side-chain tert-butyldimethylsilyloxy groups from the protected copolymers provided a significant change in solubility of the polymers due to the large polarity change. Submicron positive-tone images were obtained from the copolymers containing an onium salt as a photoacid generator by irradiation with electron beam and development with alkaline solutions. The polymer films also showed very high oxygen plasma etch resistance compared with novolac resins. The silicon-containing maleimide polymers were found to have required properties, such as good alkaline solubility after deprotection, superior adhesion, low optical density, high thermal stability with high T-g, and high plasma etch resistance for applications as deep ultraviolet and electron beam resist materials. (C) 1997 John Wiley & Sons, Inc.-
dc.languageEnglish-
dc.publisherJOHN WILEY & SONS INC-
dc.subjectTRIARYLSULFONIUM-
dc.subjectSALTS-
dc.titlePolymerization of N-(tert-butyldimethylsilyloxy)maleimide and applications of the polymers as resist materials-
dc.typeArticle-
dc.identifier.doi10.1002/(SICI)1097-4628(19971226)66:13<2507::AID-APP13>3.3.CO;2-Y-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED POLYMER SCIENCE, v.66, no.13, pp.2507 - 2516-
dc.citation.titleJOURNAL OF APPLIED POLYMER SCIENCE-
dc.citation.volume66-
dc.citation.number13-
dc.citation.startPage2507-
dc.citation.endPage2516-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1997YH52400013-
dc.identifier.scopusid2-s2.0-85085782779-
dc.relation.journalWebOfScienceCategoryPolymer Science-
dc.relation.journalResearchAreaPolymer Science-
dc.type.docTypeArticle-
dc.subject.keywordPlusTRIARYLSULFONIUM-
dc.subject.keywordPlusSALTS-
dc.subject.keywordAuthorN-(tert-butyldimethylsilyloxy)maleimide-
dc.subject.keywordAuthorsilicon-containing maleimide polymers-
dc.subject.keywordAuthoracidolytic deprotection-
dc.subject.keywordAuthorresist materials-
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