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dc.contributor.author정재식-
dc.contributor.author변동진-
dc.contributor.author김병호-
dc.contributor.author이재인-
dc.contributor.author유지범-
dc.contributor.author금동화-
dc.date.accessioned2024-01-21T17:46:46Z-
dc.date.available2024-01-21T17:46:46Z-
dc.date.created2022-01-10-
dc.date.issued1997-11-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/143518-
dc.titleEffect of substrate surface roughness modified by nitridation on GaN growth-
dc.title.alternative질화처리에 의한 기판 평면 평활도의 변화가 GaN 성장에 미치는 영향-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitation한국재료학회지 = Korean Journal of Materials Research, v.7, no.11, pp.986 - 990-
dc.citation.title한국재료학회지 = Korean Journal of Materials Research-
dc.citation.volume7-
dc.citation.number11-
dc.citation.startPage986-
dc.citation.endPage990-
dc.subject.keywordAuthorGaN film-
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