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dc.contributor.authorCho, JS-
dc.contributor.authorSong, SK-
dc.contributor.authorJung, HJ-
dc.contributor.authorKoh, SK-
dc.contributor.authorChoi, WK-
dc.contributor.authorYoon, KH-
dc.date.accessioned2024-01-21T18:33:26Z-
dc.date.available2024-01-21T18:33:26Z-
dc.date.created2022-01-11-
dc.date.issued1997-04-01-
dc.identifier.issn0261-8028-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/143849-
dc.languageEnglish-
dc.publisherCHAPMAN HALL LTD-
dc.subjectTIN OXIDE-
dc.subjectTRANSPARENT-
dc.titleLow-temperature growth of SnOx thin films using reactive ion-assisted deposition-
dc.typeArticle-
dc.identifier.doi10.1023/A:1018545217200-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF MATERIALS SCIENCE LETTERS, v.16, no.7, pp.524 - 527-
dc.citation.titleJOURNAL OF MATERIALS SCIENCE LETTERS-
dc.citation.volume16-
dc.citation.number7-
dc.citation.startPage524-
dc.citation.endPage527-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1997WU94900005-
dc.identifier.scopusid2-s2.0-0031121721-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalResearchAreaMaterials Science-
dc.type.docTypeArticle-
dc.subject.keywordPlusTIN OXIDE-
dc.subject.keywordPlusTRANSPARENT-
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