DSpace at KIST: Electrochemical characteristic on hydrogen intercalation into the interface between electrolyte of the 0.1N H//2SO//4 and amorphous tungsten oxides thin films fabricated by sol-gel method.

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DC Field	Value	Language
dc.contributor.author	민병철	-
dc.contributor.author	주재백	-
dc.contributor.author	손태원	-
dc.contributor.author	조원일	-
dc.contributor.author	강태혁	-
dc.date.accessioned	2024-01-21T19:08:28Z	-
dc.date.available	2024-01-21T19:08:28Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1996-12	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/144215	-
dc.title	Electrochemical characteristic on hydrogen intercalation into the interface between electrolyte of the 0.1N H//2SO//4 and amorphous tungsten oxides thin films fabricated by sol-gel method.	-
dc.title.alternative	졸 - 겔법으로 제조된 비정질의 텅스텐 산화물 박막과 황산 전해질 계면에서 일어나는 수소의 층간반응에 대한 전기화학적 특성 =	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	J. of Korean ind. & eng. chemistry, v.v. 7, no.no. 6, pp.1078 - 1086	-
dc.citation.title	J. of Korean ind. & eng. chemistry	-
dc.citation.volume	v. 7	-
dc.citation.number	no. 6	-
dc.citation.startPage	1078	-
dc.citation.endPage	1086	-

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