Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Park, YJ | - |
dc.contributor.author | Ozasa, K | - |
dc.contributor.author | OKeeffe, P | - |
dc.contributor.author | Aoyagi, Y | - |
dc.contributor.author | Min, SK | - |
dc.date.accessioned | 2024-01-21T19:15:36Z | - |
dc.date.available | 2024-01-21T19:15:36Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 1996-09 | - |
dc.identifier.issn | 0734-2101 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/144337 | - |
dc.description.abstract | Transient optical emission characteristics of a nitrogen gas-pulsed electron cyclotron resonance (ECR) plasma have been investigated as a first step towards understanding the nature of a nitrogen gas-pulsed plasma. We observed different transient optical emission profiles for the first negative N-2(+), the second positive N-2*, and the first positive N-2* emission bands in nitrogen gas-pulsed ECR plasma that are closely related to the pressure changes in a discharge cavity of the plasma source. On the basis of the transient emission profiles, optical emission spectra over the wavelength range 300-700 nm were obtained for three specific time regions within the pulse. During the gas-pulsed injection period large ratios of N-2*/N-2(+) (2.5-7.1) and low electron temperatures (1.2 eV) were observed. On the other hand, small ratios of N-2*/N-2(+) (0.3) and high electron temperature (2.5 eV) were recorded 0.65 a after stopping the gas-pulsed injection. These observed N-2*/N-2(+) ratios are interpreted in terms of different excitation processes and electron temperatures (T-e) due to the surge of neutral N-2 gas. The N-2*/N-2(+) ratios in an ECR gas-pulsed plasma are 5-7 times higher than those in continuous wave plasma. Through timing optimization of the transient characteristics, nitrogen gas-pulsed ECR plasma is considered to be a useful candidate for high efficiency p -type high doping in Zn(Se,Te) semiconductors or for the plasma deposition of nitride films. (C) 1996 American Vacuum Society. | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | MOLECULAR-BEAM EPITAXY | - |
dc.subject | HYDROGEN PLASMA | - |
dc.subject | P-TYPE | - |
dc.subject | GROWTH | - |
dc.subject | ZNSE | - |
dc.title | Transient characteristics of nitrogen gas-pulsed electron cyclotron resonance plasma | - |
dc.type | Article | - |
dc.identifier.doi | 10.1116/1.580204 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.14, no.5, pp.2814 - 2819 | - |
dc.citation.title | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | - |
dc.citation.volume | 14 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 2814 | - |
dc.citation.endPage | 2819 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | A1996VJ24200017 | - |
dc.identifier.scopusid | 2-s2.0-0007948025 | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | MOLECULAR-BEAM EPITAXY | - |
dc.subject.keywordPlus | HYDROGEN PLASMA | - |
dc.subject.keywordPlus | P-TYPE | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordPlus | ZNSE | - |
dc.subject.keywordAuthor | gas-pulsed plasma | - |
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