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dc.contributor.authorPark, YJ-
dc.contributor.authorOzasa, K-
dc.contributor.authorOKeeffe, P-
dc.contributor.authorAoyagi, Y-
dc.contributor.authorMin, SK-
dc.date.accessioned2024-01-21T19:15:36Z-
dc.date.available2024-01-21T19:15:36Z-
dc.date.created2021-09-05-
dc.date.issued1996-09-
dc.identifier.issn0734-2101-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/144337-
dc.description.abstractTransient optical emission characteristics of a nitrogen gas-pulsed electron cyclotron resonance (ECR) plasma have been investigated as a first step towards understanding the nature of a nitrogen gas-pulsed plasma. We observed different transient optical emission profiles for the first negative N-2(+), the second positive N-2*, and the first positive N-2* emission bands in nitrogen gas-pulsed ECR plasma that are closely related to the pressure changes in a discharge cavity of the plasma source. On the basis of the transient emission profiles, optical emission spectra over the wavelength range 300-700 nm were obtained for three specific time regions within the pulse. During the gas-pulsed injection period large ratios of N-2*/N-2(+) (2.5-7.1) and low electron temperatures (1.2 eV) were observed. On the other hand, small ratios of N-2*/N-2(+) (0.3) and high electron temperature (2.5 eV) were recorded 0.65 a after stopping the gas-pulsed injection. These observed N-2*/N-2(+) ratios are interpreted in terms of different excitation processes and electron temperatures (T-e) due to the surge of neutral N-2 gas. The N-2*/N-2(+) ratios in an ECR gas-pulsed plasma are 5-7 times higher than those in continuous wave plasma. Through timing optimization of the transient characteristics, nitrogen gas-pulsed ECR plasma is considered to be a useful candidate for high efficiency p -type high doping in Zn(Se,Te) semiconductors or for the plasma deposition of nitride films. (C) 1996 American Vacuum Society.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectMOLECULAR-BEAM EPITAXY-
dc.subjectHYDROGEN PLASMA-
dc.subjectP-TYPE-
dc.subjectGROWTH-
dc.subjectZNSE-
dc.titleTransient characteristics of nitrogen gas-pulsed electron cyclotron resonance plasma-
dc.typeArticle-
dc.identifier.doi10.1116/1.580204-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.14, no.5, pp.2814 - 2819-
dc.citation.titleJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS-
dc.citation.volume14-
dc.citation.number5-
dc.citation.startPage2814-
dc.citation.endPage2819-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1996VJ24200017-
dc.identifier.scopusid2-s2.0-0007948025-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusMOLECULAR-BEAM EPITAXY-
dc.subject.keywordPlusHYDROGEN PLASMA-
dc.subject.keywordPlusP-TYPE-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusZNSE-
dc.subject.keywordAuthorgas-pulsed plasma-
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