DSpace at KIST: Structural and electrical properties of PbTiO//3 thin films deposited on Pt/Ti by metalorganic chemical vapor deposition.

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DC Field	Value	Language
dc.contributor.author	염상섭	-
dc.contributor.author	In Sang Yang	-
dc.contributor.author	한영기	-
dc.contributor.author	D. J. Choi	-
dc.contributor.author	B. Y. Chang	-
dc.contributor.author	왕채현	-
dc.contributor.author	T. G. Lee	-
dc.date.accessioned	2024-01-21T19:33:02Z	-
dc.date.available	2024-01-21T19:33:02Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1996-07	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/144399	-
dc.title	Structural and electrical properties of PbTiO//3 thin films deposited on Pt/Ti by metalorganic chemical vapor deposition.	-
dc.title.alternative	MOCVD 법에 의해 Pt/Ti 하부전극 위에 증착한 PbTiO//3 박막의 구조적 , 전기적 특성 =	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	응용물리 = Ungyong Mulli, v.v. 9, no.no. 4, pp.541 - 548	-
dc.citation.title	응용물리 = Ungyong Mulli	-
dc.citation.volume	v. 9	-
dc.citation.number	no. 4	-
dc.citation.startPage	541	-
dc.citation.endPage	548	-
dc.subject.keywordAuthor	thin films	-

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