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dc.contributor.author김은규-
dc.contributor.author손맹호-
dc.contributor.author민석기-
dc.contributor.author한영기-
dc.contributor.author왕채현-
dc.contributor.author염상섭-
dc.date.accessioned2024-01-21T19:38:09Z-
dc.date.available2024-01-21T19:38:09Z-
dc.date.created2022-01-10-
dc.date.issued1996-04-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/144486-
dc.titlePostgrowth annealing effects of TiO//2 thin filmas grown on InP substrate at low-temperature by metal-organic chemical-va[pr deposition.-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationJournal of applied physics, v.v. 79, no.no. 8, pp.284 - ?-
dc.citation.titleJournal of applied physics-
dc.citation.volumev. 79-
dc.citation.numberno. 8-
dc.citation.startPage284-
dc.citation.endPage?-
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