DSpace at KIST: Preparation and properties of Ru based thick film resistors.

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DC Field	Value	Language
dc.contributor.author	김구대	-
dc.contributor.author	김창은	-
dc.contributor.author	강현규	-
dc.contributor.author	손용배	-
dc.date.accessioned	2024-01-21T20:41:28Z	-
dc.date.available	2024-01-21T20:41:28Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1995-05	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/145094	-
dc.title	Preparation and properties of Ru based thick film resistors.	-
dc.title.alternative	Ru 계 후막저항체의 제조 및 특성 연구 =	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	한국 하이브리드 마이크로일렉트로닉스 학회지 = Journa of ISHA-Korea., v.v. 2, no.no. 1, pp.19 - 27	-
dc.citation.title	한국 하이브리드 마이크로일렉트로닉스 학회지 = Journa of ISHA-Korea.	-
dc.citation.volume	v. 2	-
dc.citation.number	no. 1	-
dc.citation.startPage	19	-
dc.citation.endPage	27	-
dc.subject.keywordAuthor	pyrochlore	-
dc.subject.keywordAuthor	temperature coefficient resistant	-
dc.subject.keywordAuthor	Ru based thick film resistors	-

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