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dc.contributor.author주병권-
dc.contributor.author이윤희-
dc.contributor.author정회환-
dc.contributor.author정관수-
dc.contributor.authorD. B. Murfett-
dc.contributor.authorM. R. Haskard-
dc.contributor.author차균현-
dc.contributor.author오명환-
dc.date.accessioned2024-01-21T20:45:25Z-
dc.date.available2024-01-21T20:45:25Z-
dc.date.created2022-01-10-
dc.date.issued1995-03-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/145160-
dc.title직접접합된 실리콘 기판쌍에 있어서 계면 산화막의 상태와 이의 새로운 평가방법 .-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitation전자공학회논문지 ., v.v. 32A, no.no. 3, pp.134 - 142-
dc.citation.title전자공학회논문지 .-
dc.citation.volumev. 32A-
dc.citation.numberno. 3-
dc.citation.startPage134-
dc.citation.endPage142-
dc.subject.keywordAuthormicromachining-
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