DSpace at KIST: Effect of excess oxygen on the properties of reactive sputtered RuO//x thin films.

Full metadata record

DC Field	Value	Language
dc.contributor.author	김용태	-
dc.contributor.author	이정건	-
dc.contributor.author	조성호	-
dc.contributor.author	민석기	-
dc.date.accessioned	2024-01-21T21:05:37Z	-
dc.date.available	2024-01-21T21:05:37Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1995-01	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/145272	-
dc.title	Effect of excess oxygen on the properties of reactive sputtered RuO//x thin films.	-
dc.type	Article	-
dc.description.journalClass	3	-
dc.identifier.bibliographicCitation	J. appl. phys., v.v. 77, pp.5473 - 5475	-
dc.citation.title	J. appl. phys.	-
dc.citation.volume	v. 77	-
dc.citation.startPage	5473	-
dc.citation.endPage	5475	-

Show Simple Item Record

KIST Library Institutional Repository