Full metadata record

DC Field Value Language
dc.contributor.authorHAN, IK-
dc.contributor.authorHER, J-
dc.contributor.authorBYUN, YT-
dc.contributor.authorLEE, S-
dc.contributor.authorWOO, DH-
dc.contributor.authorLEE, Jung Il-
dc.contributor.authorKIM, SH-
dc.contributor.authorKANG, KN-
dc.contributor.authorPARK, HL-
dc.date.accessioned2024-01-21T21:16:14Z-
dc.date.available2024-01-21T21:16:14Z-
dc.date.created2021-09-02-
dc.date.issued1994-12-
dc.identifier.issn0021-4922-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/145451-
dc.description.abstractWe report on a metal-semiconductor-metal (MSM) photodetector on sulfur-treated undoped InP. We show that the dark current and capacitance of the sulfur-treated detector are 100 times lower and 30% smaller than those of the untreated detector, respectively. The improved performance of the detector characteristics is understood in terms of Fermi level depinning and the existence of a thin layer of InPxSy between the contact metal and semiconductor due to sulfur treatment. We found that it is necessary to anneal the sulfur-treated substrates at 270 degrees C to obtain such improved device characteristics. The reason is attributed- to the formation of thermally stable In-S bonds.-
dc.languageEnglish-
dc.publisherJAPAN J APPLIED PHYSICS-
dc.subjectELECTRONIC-PROPERTIES-
dc.subjectPASSIVATED INP-
dc.subjectSURFACE-
dc.subjectGAAS-
dc.subject(NH4)2SX-
dc.subjectPERFORMANCE-
dc.subjectREDUCTION-
dc.subjectDIODES-
dc.titleLOW DARK CURRENT AND HIGH-SPEED METAL-SEMICONDUCTOR-METAL PHOTODETECTOR ON SULFUR-TREATED INP-
dc.typeArticle-
dc.identifier.doi10.1143/JJAP.33.6454-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.33, no.12A, pp.6454 - 6457-
dc.citation.titleJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS-
dc.citation.volume33-
dc.citation.number12A-
dc.citation.startPage6454-
dc.citation.endPage6457-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1994RX26200006-
dc.identifier.scopusid2-s2.0-84957320841-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusELECTRONIC-PROPERTIES-
dc.subject.keywordPlusPASSIVATED INP-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordPlusGAAS-
dc.subject.keywordPlus(NH4)2SX-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusREDUCTION-
dc.subject.keywordPlusDIODES-
dc.subject.keywordAuthorMSM PD-
dc.subject.keywordAuthorINP-
dc.subject.keywordAuthorSULFUR TREATMENT-
dc.subject.keywordAuthorHIGH SPEED-
dc.subject.keywordAuthorSCHOTTKY BARRIER HEIGHT-
Appears in Collections:
KIST Article > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE