Full metadata record
DC Field | Value | Language |
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dc.contributor.author | HAN, IK | - |
dc.contributor.author | HER, J | - |
dc.contributor.author | BYUN, YT | - |
dc.contributor.author | LEE, S | - |
dc.contributor.author | WOO, DH | - |
dc.contributor.author | LEE, Jung Il | - |
dc.contributor.author | KIM, SH | - |
dc.contributor.author | KANG, KN | - |
dc.contributor.author | PARK, HL | - |
dc.date.accessioned | 2024-01-21T21:16:14Z | - |
dc.date.available | 2024-01-21T21:16:14Z | - |
dc.date.created | 2021-09-02 | - |
dc.date.issued | 1994-12 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/145451 | - |
dc.description.abstract | We report on a metal-semiconductor-metal (MSM) photodetector on sulfur-treated undoped InP. We show that the dark current and capacitance of the sulfur-treated detector are 100 times lower and 30% smaller than those of the untreated detector, respectively. The improved performance of the detector characteristics is understood in terms of Fermi level depinning and the existence of a thin layer of InPxSy between the contact metal and semiconductor due to sulfur treatment. We found that it is necessary to anneal the sulfur-treated substrates at 270 degrees C to obtain such improved device characteristics. The reason is attributed- to the formation of thermally stable In-S bonds. | - |
dc.language | English | - |
dc.publisher | JAPAN J APPLIED PHYSICS | - |
dc.subject | ELECTRONIC-PROPERTIES | - |
dc.subject | PASSIVATED INP | - |
dc.subject | SURFACE | - |
dc.subject | GAAS | - |
dc.subject | (NH4)2SX | - |
dc.subject | PERFORMANCE | - |
dc.subject | REDUCTION | - |
dc.subject | DIODES | - |
dc.title | LOW DARK CURRENT AND HIGH-SPEED METAL-SEMICONDUCTOR-METAL PHOTODETECTOR ON SULFUR-TREATED INP | - |
dc.type | Article | - |
dc.identifier.doi | 10.1143/JJAP.33.6454 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.33, no.12A, pp.6454 - 6457 | - |
dc.citation.title | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | - |
dc.citation.volume | 33 | - |
dc.citation.number | 12A | - |
dc.citation.startPage | 6454 | - |
dc.citation.endPage | 6457 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | A1994RX26200006 | - |
dc.identifier.scopusid | 2-s2.0-84957320841 | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | ELECTRONIC-PROPERTIES | - |
dc.subject.keywordPlus | PASSIVATED INP | - |
dc.subject.keywordPlus | SURFACE | - |
dc.subject.keywordPlus | GAAS | - |
dc.subject.keywordPlus | (NH4)2SX | - |
dc.subject.keywordPlus | PERFORMANCE | - |
dc.subject.keywordPlus | REDUCTION | - |
dc.subject.keywordPlus | DIODES | - |
dc.subject.keywordAuthor | MSM PD | - |
dc.subject.keywordAuthor | INP | - |
dc.subject.keywordAuthor | SULFUR TREATMENT | - |
dc.subject.keywordAuthor | HIGH SPEED | - |
dc.subject.keywordAuthor | SCHOTTKY BARRIER HEIGHT | - |
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