NOVEL FUNCTIONAL POLYMERS FROM N-(TOSYLOXY)MALEIMIDE - PHOTOCHEMICAL ACID GENERATION IN SOLID-STATE AND APPLICATION AS RESIST MATERIALS

Abstract

N-(Tosyloxy)maleimide (TsOMI) has been synthesized and used to make a novel functional maleimide polymer, and the photochemical and thermal properties of its styrenic copolymers were investigated. The N-(tosyloxy)maleimide unit in the alternating copolymers was designed for photochemical acid generation and the copolymers generated p-toluenesulfonic acid by deep-UV irradiation over 30 mol % based on the TsOMI content. The photochemical acid generation was much enhanced when hydroquinone was added. A t-BOC-protected copolymer, poly[TsOMI-alt-p-(((tert-butyloxy)carbonyl)oxy)styrene], showed the capability of a single-component resist system in the deep-UV region based on the chemical amplification concept. The single-component resist rendered negative- and positive-tone images by developing with suitable solvents.