DSpace at KIST: 화학증폭을 이용한 원자외선용 포지티브 레지스트의 표면 불용성 억제

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DC Field	Value	Language
dc.contributor.author	양승관	-
dc.contributor.author	박찬언	-
dc.contributor.author	강종희	-
dc.contributor.author	안광덕	-
dc.date.accessioned	2024-01-21T21:35:21Z	-
dc.date.available	2024-01-21T21:35:21Z	-
dc.date.created	2022-01-10	-
dc.date.issued	1994-07	-
dc.identifier.issn	0379-153X	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/145545	-
dc.language	Korean	-
dc.publisher	한국고분자학회	-
dc.title	화학증폭을 이용한 원자외선용 포지티브 레지스트의 표면 불용성 억제	-
dc.title.alternative	Inhibition of surface insolubilization in chemically amplified positive type deep-UV resists.	-
dc.type	Article	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	폴리머, v.v. 18, no.no. 4, pp.622 - 631	-
dc.citation.title	폴리머	-
dc.citation.volume	v. 18	-
dc.citation.number	no. 4	-
dc.citation.startPage	622	-
dc.citation.endPage	631	-
dc.description.isOpenAccess	N	-
dc.description.journalRegisteredClass	other	-
dc.subject.keywordAuthor	deep UV resists	-

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