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dc.contributor.authorKANG, WN-
dc.contributor.authorYOON, YS-
dc.contributor.authorYOM, SS-
dc.date.accessioned2024-01-21T21:37:03Z-
dc.date.available2024-01-21T21:37:03Z-
dc.date.created2022-01-10-
dc.date.issued1994-06-
dc.identifier.issn0953-2048-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/145573-
dc.description.abstractYBa2Cu3O7-x superconducting thin films were grown on polycrystalline yttria-stabilized zirconia (p-YSZ) and single-crystalline SrTiO3 substrates by DC plasma-assisted metallorganic chemical vapour deposition. A DC plasma was generated in the reaction chamber by applying a DC potential of 200 V at a plasma current of 2 mA. The as-deposited films on an SrTiO3 substrate at a temperature of 730-degrees-C show a sharp resistive transition of T(c,zero) = 88 K. We show that DC plasma-assisted metallorganic chemical vapour deposition is useful to obtain YBa2Cu3O7-x thin films with the c axis normal to the p-ysz and SrTiO3 substrates.-
dc.languageEnglish-
dc.publisherIOP PUBLISHING LTD-
dc.subjectCU-O FILMS-
dc.subjectLOW-TEMPERATURE-
dc.subjectGROWTH-
dc.titleSUPERCONDUCTING YBA2CU3O7-X THIN-FILMS PREPARED BY DC PLASMA CHEMICAL-VAPOR-DEPOSITION-
dc.typeArticle-
dc.identifier.doi10.1088/0953-2048/7/6/001-
dc.description.journalClass1-
dc.identifier.bibliographicCitationSUPERCONDUCTOR SCIENCE & TECHNOLOGY, v.7, no.6, pp.333 - 336-
dc.citation.titleSUPERCONDUCTOR SCIENCE & TECHNOLOGY-
dc.citation.volume7-
dc.citation.number6-
dc.citation.startPage333-
dc.citation.endPage336-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1994NR83800001-
dc.identifier.scopusid2-s2.0-0028446954-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusCU-O FILMS-
dc.subject.keywordPlusLOW-TEMPERATURE-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordAuthorthin films-
dc.subject.keywordAuthorYBa2Cu3O7-x-
dc.subject.keywordAuthordc plasma CVD-
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