Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | AHN, KD | - |
dc.contributor.author | KOO, DI | - |
dc.date.accessioned | 2024-01-21T22:10:03Z | - |
dc.date.available | 2024-01-21T22:10:03Z | - |
dc.date.created | 2022-01-10 | - |
dc.date.issued | 1994-01 | - |
dc.identifier.issn | 0097-6156 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/145896 | - |
dc.description.abstract | N-(tert-Butoxy)maleimide, t-BuOMI was synthesized as a new kind of a protected acid-labile monomer. Its radical copolymerizations were performed and the thermal deprotection behavior of its copolymers were investigated. t-BuOMI was readily copolymerized with styrene derivatives (X-SO to give copolymers, P(t-BuOMI/X-St) in high conversions. The t-BuOMI units of the tert-butyl (t-Bu) protected copolymers were converted into the N-hydroxymaleimide (HOMI) units by heating at about 280 degrees C releasing 2-methylpropene and the facile deprotection of the side-chain t-Bu groups resulted in a large polarity change in the polymer structure. The deprotected copolymers, P(HOMI/X-St) have very high glass transition temperatures higher than about 250 degrees C and showed solubilities in aqueous base solutions whereas the protected polymers are soluble only in organic solvents. Acidolytic deprotection of P(t-BuOMI/St) was observed at 130 degrees C or lower temperatures in the presence of catalytic acids. Resist solutions of P(t-BuOMI/St) containing triphenylsulfonium salts as a photoacid generator were prepared and the films were imagewise exposed to 260 nm light by a contact mode. The films were post-exposure baked at 130 degrees C and were followed by development with 2.38 wt% TMAH solution to obtain positive tone images. | - |
dc.language | English | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | COPOLYMERS | - |
dc.subject | DESIGN | - |
dc.title | SYNTHESIS AND POLYMERIZATIONS OF N-(TERT-BUTOXY)MALEIMIDE AND APPLICATION OF ITS POLYMERS AS A CHEMICAL AMPLIFICATION RESIST | - |
dc.type | Article | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | POLYMERS FOR MICROELECTRONICS: RESISTS AND DIELECTRICS, v.537, pp.124 - 141 | - |
dc.citation.title | POLYMERS FOR MICROELECTRONICS: RESISTS AND DIELECTRICS | - |
dc.citation.volume | 537 | - |
dc.citation.startPage | 124 | - |
dc.citation.endPage | 141 | - |
dc.description.journalRegisteredClass | scie | - |
dc.identifier.wosid | A1994BZ96S00009 | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Polymer Science | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Polymer Science | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.subject.keywordPlus | COPOLYMERS | - |
dc.subject.keywordPlus | DESIGN | - |
dc.subject.keywordAuthor | N-(t-butoxy)maleimide | - |
dc.subject.keywordAuthor | protected polymers | - |
dc.subject.keywordAuthor | thermal deprotection | - |
dc.subject.keywordAuthor | acidolytic deprotection deep UV photoresists | - |
dc.subject.keywordAuthor | thermally stable resists | - |
dc.subject.keywordAuthor | chemical amplification resists | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.