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dc.contributor.authorAHN, KD-
dc.contributor.authorKOO, DI-
dc.date.accessioned2024-01-21T22:10:03Z-
dc.date.available2024-01-21T22:10:03Z-
dc.date.created2022-01-10-
dc.date.issued1994-01-
dc.identifier.issn0097-6156-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/145896-
dc.description.abstractN-(tert-Butoxy)maleimide, t-BuOMI was synthesized as a new kind of a protected acid-labile monomer. Its radical copolymerizations were performed and the thermal deprotection behavior of its copolymers were investigated. t-BuOMI was readily copolymerized with styrene derivatives (X-SO to give copolymers, P(t-BuOMI/X-St) in high conversions. The t-BuOMI units of the tert-butyl (t-Bu) protected copolymers were converted into the N-hydroxymaleimide (HOMI) units by heating at about 280 degrees C releasing 2-methylpropene and the facile deprotection of the side-chain t-Bu groups resulted in a large polarity change in the polymer structure. The deprotected copolymers, P(HOMI/X-St) have very high glass transition temperatures higher than about 250 degrees C and showed solubilities in aqueous base solutions whereas the protected polymers are soluble only in organic solvents. Acidolytic deprotection of P(t-BuOMI/St) was observed at 130 degrees C or lower temperatures in the presence of catalytic acids. Resist solutions of P(t-BuOMI/St) containing triphenylsulfonium salts as a photoacid generator were prepared and the films were imagewise exposed to 260 nm light by a contact mode. The films were post-exposure baked at 130 degrees C and were followed by development with 2.38 wt% TMAH solution to obtain positive tone images.-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.subjectCOPOLYMERS-
dc.subjectDESIGN-
dc.titleSYNTHESIS AND POLYMERIZATIONS OF N-(TERT-BUTOXY)MALEIMIDE AND APPLICATION OF ITS POLYMERS AS A CHEMICAL AMPLIFICATION RESIST-
dc.typeArticle-
dc.description.journalClass1-
dc.identifier.bibliographicCitationPOLYMERS FOR MICROELECTRONICS: RESISTS AND DIELECTRICS, v.537, pp.124 - 141-
dc.citation.titlePOLYMERS FOR MICROELECTRONICS: RESISTS AND DIELECTRICS-
dc.citation.volume537-
dc.citation.startPage124-
dc.citation.endPage141-
dc.description.journalRegisteredClassscie-
dc.identifier.wosidA1994BZ96S00009-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryPolymer Science-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaPolymer Science-
dc.type.docTypeArticle; Proceedings Paper-
dc.subject.keywordPlusCOPOLYMERS-
dc.subject.keywordPlusDESIGN-
dc.subject.keywordAuthorN-(t-butoxy)maleimide-
dc.subject.keywordAuthorprotected polymers-
dc.subject.keywordAuthorthermal deprotection-
dc.subject.keywordAuthoracidolytic deprotection deep UV photoresists-
dc.subject.keywordAuthorthermally stable resists-
dc.subject.keywordAuthorchemical amplification resists-
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