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dc.contributor.authorT. S. Kim-
dc.contributor.author오명환-
dc.contributor.authorC. H. Kim-
dc.date.accessioned2024-01-21T22:37:46Z-
dc.date.available2024-01-21T22:37:46Z-
dc.date.created2022-01-10-
dc.date.issued1993-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/146130-
dc.titleInfluence of indium tin oxide layer on the properties of RF magnetron sputtered (BaSr)TiO//3 thin films on indium tin oxide-coated glass substrate.-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitationJapanese journal of applied physics, part 1., v.v. 32, no.no. 6A, pp.2837 - 2837-
dc.citation.titleJapanese journal of applied physics, part 1.-
dc.citation.volumev. 32-
dc.citation.numberno. 6A-
dc.citation.startPage2837-
dc.citation.endPage2837-
dc.subject.keywordAuthorelectroluminescent display-
dc.subject.keywordAuthorthin film-
dc.subject.keywordAuthorinsulator-
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