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dc.contributor.authorKIM, EK-
dc.contributor.authorCHO, HY-
dc.contributor.authorYOON, JH-
dc.contributor.authorMIN, SK-
dc.contributor.authorJUNG, YL-
dc.contributor.authorLEE, WH-
dc.date.accessioned2024-01-22T00:14:07Z-
dc.date.available2024-01-22T00:14:07Z-
dc.date.created2021-09-05-
dc.date.issued1990-08-15-
dc.identifier.issn0021-8979-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/147064-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.titleDEEP LEVELS IN UNDOPED BULK INP AFTER RAPID THERMAL ANNEALING-
dc.typeArticle-
dc.identifier.doi10.1063/1.346649-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED PHYSICS, v.68, no.4, pp.1665 - 1668-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume68-
dc.citation.number4-
dc.citation.startPage1665-
dc.citation.endPage1668-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosidA1990DR59800038-
dc.identifier.scopusid2-s2.0-0043031266-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordAuthordeep level-
dc.subject.keywordAuthorInP-
dc.subject.keywordAuthorrapid thermal annealing-
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