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dc.contributor.author정형진-
dc.contributor.author최두진-
dc.date.accessioned2024-01-22T01:07:23Z-
dc.date.available2024-01-22T01:07:23Z-
dc.date.created2022-01-10-
dc.date.issued1989-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/147507-
dc.titleProperties of the Chemically Vapor Deposited Alumina Thin Film and Powder on Heat Treatment-
dc.title.alternativeCVD 법으로 합성된 알루미나 박막 및 분말의 열처리에 따른 특성 .-
dc.typeArticle-
dc.description.journalClass3-
dc.identifier.bibliographicCitation한국요업학회지, v.v. 26, no.no. 2, pp.235 - 241-
dc.citation.title한국요업학회지-
dc.citation.volumev. 26-
dc.citation.numberno. 2-
dc.citation.startPage235-
dc.citation.endPage241-
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