Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim Yong Tae | - |
dc.contributor.author | S. P. Jeong | - |
dc.contributor.author | D. J. Kim | - |
dc.contributor.author | J. W. Park | - |
dc.contributor.author | Min Suk-Ki | - |
dc.date.accessioned | 2024-02-21T05:06:12Z | - |
dc.date.available | 2024-02-21T05:06:12Z | - |
dc.date.issued | 1996-01 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/148824 | - |
dc.title | Nitrogen effects of Ta-Si-N diffusion barrier in Si/Cu metallization. | - |
dc.title.alternative | Nitrogen effects of Ta-Si-N diffusion barrier in Si/Cu metallization. | - |
dc.type | Book | - |
dc.citation.startPage | ? | - |
dc.citation.endPage | ? | - |
dc.relation.isPartOfSeries | 한국물리학회 제 72 회 학술논문발표회 | - |
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