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dc.contributor.authorKim Yong Tae-
dc.contributor.authorS. P. Jeong-
dc.contributor.authorD. J. Kim-
dc.contributor.authorJ. W. Park-
dc.contributor.authorMin Suk-Ki-
dc.date.accessioned2024-02-21T05:06:12Z-
dc.date.available2024-02-21T05:06:12Z-
dc.date.issued1996-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/148824-
dc.titleNitrogen effects of Ta-Si-N diffusion barrier in Si/Cu metallization.-
dc.title.alternativeNitrogen effects of Ta-Si-N diffusion barrier in Si/Cu metallization.-
dc.typeBook-
dc.citation.startPage?-
dc.citation.endPage?-
dc.relation.isPartOfSeries한국물리학회 제 72 회 학술논문발표회-
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