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dc.contributor.authorPark Young Ju-
dc.contributor.authorK. Ozasa-
dc.contributor.authorY. Aoyagi-
dc.date.accessioned2024-02-21T05:07:12Z-
dc.date.available2024-02-21T05:07:12Z-
dc.date.issued1995-02-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/148847-
dc.subjectSP-CBE-
dc.titleプラズマパスの발생とそれを용いた반도체표면반응の제어-
dc.title.alternativeCreation of high-peak plasma-pulses and control of surface reaction in short-pulsed chemical beam epitaxy.-
dc.typeBook-
dc.citation.startPage11-
dc.citation.endPage14-
dc.relation.isPartOfSeries이연シンポジウム제4회반응제어による표면가공기술-
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