Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim Yong Tae | - |
| dc.contributor.author | 이창우 | - |
| dc.date.accessioned | 2024-02-21T05:09:04Z | - |
| dc.date.available | 2024-02-21T05:09:04Z | - |
| dc.date.issued | 1995-01 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/148891 | - |
| dc.title | Nitrogen ion mixed tungsten thin films for metal-organic chemical vapor deposited Cu metallization. | - |
| dc.title.alternative | Nitrogen ion mixed tungsten thin films for metal-organic chemical vapor deposited Cu metallization. | - |
| dc.type | Book | - |
| dc.citation.startPage | 910 | - |
| dc.citation.endPage | 913 | - |
| dc.relation.isPartOfSeries | Ion implantation technology-94 | - |
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